- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2251 - Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups , or by measuring secondary emission from the material using electron or ion microprobes using incident electron beams, e.g. scanning electron microscopy [SEM]
Patent holdings for IPC class G01N 23/2251
Total number of patents in this class: 575
10-year publication summary
1
|
9
|
20
|
37
|
63
|
74
|
105
|
95
|
106
|
36
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hitachi High-Tech Corporation | 4424 |
81 |
ASML Netherlands B.V. | 6816 |
52 |
NuFlare Technology, Inc. | 770 |
31 |
KLA Corporation | 1223 |
22 |
Applied Materials Israel, Ltd. | 549 |
17 |
KLA-Tencor Corporation | 2574 |
17 |
Applied Materials, Inc. | 16587 |
15 |
Samsung Electronics Co., Ltd. | 131630 |
14 |
FEI Company | 851 |
14 |
Saudi Arabian Oil Company | 11322 |
10 |
TASMIT, Inc. | 52 |
9 |
Techinsights Inc. | 92 |
8 |
Carl Zeiss SMT GmbH | 2646 |
6 |
JFE Steel Corporation | 6067 |
6 |
National Institute for Materials Science | 1108 |
6 |
Nikon Corporation | 7162 |
5 |
Carl Zeiss Microscopy GmbH | 1146 |
5 |
Oxford Instruments NanoTechnology Tools Limited | 145 |
5 |
Hitachi High-Technologies Corporation | 2034 |
4 |
Nova Measuring Instruments Inc. | 59 |
4 |
Other owners | 244 |